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The Working Principle of the ESY-10 S

The working principle of the LPE-equipment unit is the technology of liquid phase epitaxy (LPE) utilizing a rotating-dipping boat technique. The substrates, positioned at the 4 outside surfaces of a cubic graphite block (substrate holder), are dipped into the melt at high temperatures < 600°C.

The substrate holder can be rotated during deposition of the layer, which is realized by controlled cooling of the whole crucible system with substrates and melt. The inner graphite crucible is almost sealed against outer tube atmosphere to minimize loss of vaporized mercury. This remaining loss can be compensated by using an independently heated built-in Hg-source.

Unique crucible design and material lead to perfect wafer surface protection, layer growth and easy removing of solid melt after epitaxial growth.