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The Graphite System of the ESY-10 TTT

In principle the ESY-10 graphite system consists of alternating fixed and movable graphite plates with hollows holding the substrates. The system capacity is determined by the stack height of the graphite plates. The crucible is placed on top of the graphite stack and contains the melts for the epitaxial process.

  1. A. Filling melt 1 into melt chambers of movable graphite plates.
  2. B. Moving melt 1 to growth-position above wafer. Filling Melt 2 into next melt chambers.
  3. C. Removing melt 1. Moving Melt 2 to growth position above wafers. Filling Melt 3 into next melt chambers etc

Available LPE Production Technologies

Technology
Type
Emission
Wavelength
No. of
Melts
Max. Capacity
(wafers)
Process
Duration (hrs)
Standard IR 940 nm 1 200 10
Power IR 870 nm 1 200 20
Power IR (Low UF) 870 nm 2 100 21
Power Window IR 930 nm 2 100 12
Power IrDA 870 870 nm 5 50 22
Power IrDA 850 850 nm 5 50 22